Lithography and semiconductor volume/testing are important components of semiconductor equipment, and equipment upgrades drive technological node progress. Semiconductor equipment has ten categories of equipment, lithography and volume/testing equipment for semiconductor manufacturing important equipment. According to Gartner data, lithography machines and semiconductor volume/inspection equipment account for 17% and 12% of the semiconductor equipment market, respectively. When the technology node is upgraded to 5nm and below, the semiconductor manufacturing process changes greatly, and the further complexity of microstructure and manufacturing processes drives the continuous upgrading of process equipment and quality control equipment. The precision of DUV lithography machine is limited by its wavelength, and its precision can no longer meet the process requirements. Wafer factories need to purchase more expensive EUV lithography machines, or use multiple template processes to repeat multiple film deposition and etching processes to achieve smaller line widths, which significantly increases the number of film deposition and etching, and also puts forward higher requirements for yield control. Therefore, we believe that the future fab needs to invest more and more advanced process equipment and yield control equipment.

Precision optical systems are important components of lithography machines and volume/detection equipment, covering the entire semiconductor manufacturing process. In the semiconductor manufacturing process, the production of a qualified device requires hundreds of processing steps, each of which requires the use of related equipment for manufacturing and yield control. According to KLA (Ketian Semiconductor), semiconductor quantity/detection basically covers the whole process of semiconductor manufacturing, in which the principle of quantity/detection equipment is mainly optical detection, and each step must be carried out perfectly to avoid fatal defects. In addition, for semiconductor devices, lithography is an important part of structure formation, and the lithography system, as a key component of the lithography machine, directly affects the process, speed and yield. Therefore, we believe that the precision optical system has a significant impact on the manufacturing process and yield control, and is the core system of semiconductor equipment.